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Issue Date
Title
Author(s)
2005-06-01
Effect of point defect injection on diffusion of boron in silicon and silicon–germanium in the presence of carbon
Karunaratne, M. S. A
;
Willoughby, A F W
;
Bonar, J M
;
Zhang, J
;
Ashburn, P
2005-03-21
Effect of fluorine implantation dose on boron transient enhanced diffusion and boron thermal diffusion in Si/sub 1-x/Ge/sub x
Mubarek, HAW El
;
Bonar, J M
;
Dilliway, G D
;
Wang, Y
;
Hemment, Peter L F
;
Willoughby, A F
;
Ashburn, Peter
;
Karunaratne, M. S. A
Discover
Author
2
Karunaratne, M. S. A
1
Ashburn, P
1
Ashburn, Peter
1
Dilliway, G D
1
Hemment, Peter L F
1
Mubarek, HAW El
1
Wang, Y
1
Willoughby, A F
1
Willoughby, A F W
1
Zhang, J
.
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Subject
1
Mass spectroscopy
1
Silicon alloys
1
silicon–germanium
.
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Date issued
2
2005