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dc.contributor.authorPichler, Peter-
dc.contributor.authorOrtiz, Christophe J-
dc.contributor.authorColombeau, Benjamin-
dc.contributor.authorCowern, Nicholas E B-
dc.contributor.authorLampin, Evelyne-
dc.contributor.authorUppal, Suresh-
dc.contributor.authorKarunaratne, M. S. A-
dc.date.accessioned2021-10-26T07:38:12Z-
dc.date.available2021-10-26T07:38:12Z-
dc.date.issued2006-08-17-
dc.identifier.citation8en_US
dc.identifier.issn1402-4896-
dc.identifier.urihttp://localhost:8080/jspui/handle/123456789/260-
dc.description.abstractA quantitative description of the transient diffusion and activation of boron during post-implantation annealing steps is one of the most challenging tasks in the simulation of silicon doping processes. In industrially relevant situations, simulations needs to address diffusion at extrinsic concentrations, the agglomeration of self-interstitials, and the formation of boron-interstitial clusters. This paper describes the experimental work performed or used to calibrate model parameters as independently as possible. The combined model is then applied to ultra-shallow junction formation by annealing boron implanted into crystalline or preamorphized silicon. In comparison to bulk silicon, much less is known about diffusion of dopants in SiGe and germanium which are considered as technological options for future technology nodes. Therefore, dedicated experiments were performed to clarify open points in the diffusion behaviour of dopants in these materials.en_US
dc.language.isoenen_US
dc.publisherIOP Publishingen_US
dc.relation.ispartofseriesPhysica Scripta;Vol 2006 Issue T126 Pages 89-
dc.subjectDiffusionen_US
dc.subjectactivationen_US
dc.subjectdopantsen_US
dc.subjectsiliconen_US
dc.subjectadvanced silicon-based materialsen_US
dc.titleDiffusion and activation of dopants in silicon and advanced silicon-based materialsen_US
dc.typeArticleen_US
dc.identifier.doihttps://doi.org/10.1088/0031-8949/2006/T126/021en_US
Appears in Collections:Research Papers - Department of Civil Engineering
Research Papers - Department of Materials Engineering
Research Papers - SLIIT Staff Publications

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