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Issue Date | Title | Author(s) |
---|---|---|
2004-10-15 | Effect of fluorine implantation dose on boron thermal diffusion in silicon | Mubarek, H A. W El; Bonar, J.M; Dilliway, G.D; Karunaratne, M. S. A; Willoughby, A. F; Wang, Y |
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- 1 2004